Microwave Plasma Chemical Vapor Deposition (MP∑↕CVD) refers to the high-purity hydrogen (H2)≈ & and methane gas (CH4) was pipedλ<∞ into a vacuum chamber，the hydrogen generates ‌βa plasma fireball under the actioΩ↑→n of microwave, and th>≠ e methane gas to open the c∑εhemical bond under the action of pla★∏∞sma turns into free carbon atoms (C) a↓≠nd hydrogen atoms (H). The free carbon atoms wi >±'ll gradually be deposited on the ✘×<diamond seeds at the bottom ↔‍↑of the chamber under the action ofε© the powerful plasma, making♥φδ  the seeds grow thicker. Finally, CVD$≥↔ diamond with the same structure and c&♠δ₽omposition as natural♣< diamond was formed.